Advanced plasma processes for industrial applications

SAIREM develops advanced microwave and radio frequency plasma technologies dedicated to high-performance industrial processes. Our solutions are engineered to ensure precise plasma control, process stability, and energy efficiency across demanding applications.

We support a wide range of plasma processes, including plasma etching and deposition, PECVD, gas abatement, methane plasmalysis, and Power-to-X technologies. Designed for uniform plasma generation and accurate parameter control, our systems enable optimized reaction conditions, improved yields, and scalable industrial integration.

To support these processes, SAIREM designs and manufactures high-performance microwave and radio frequency plasma sources and power generators, ensuring stable energy coupling, reliable operation, and long-term industrial performance.

With deep expertise in plasma engineering, SAIREM delivers reliable and efficient solutions for next-generation industrial plasma applications.

Advanced plasma applications

Explore our microwave alternative plasma processes.

PE-ALD, PE-ALE, PE-CVD Etching & deposition Etching & deposition
Methane plasmalysis Methane plasmalysis
Power-to-X Power-to-X
Lab grown diamond Lab grown diamond
Gas abatement Gas abatement

Key advantages of microwave plasma

Homogeneous and stable plasma

Our technologies generate highly uniform plasma, ensuring consistent treatment conditions and improved process repeatability.

High ionization efficiency

High ionization density enables enhanced reaction kinetics, optimized yields, and improved process performance.

picto maintenance

Scalable multi-source architecture

Multi-source integration enables wide and uniform plasma distribution, supporting large-area processing and seamless industrial scale-up.

picto ampoule

Efficient power transfer

Direct energy coupling minimizes power losses, ensuring high energy efficiency and stable plasma generation.