PlasmaVac – Low pressure microwave plasma sources
PlasmaVac — Innovative Microwave Plasma Sources for Large-Scale Processing
Meeting the demands of uniform, high-density plasma over large substrate areas requires overcoming a fundamental challenge: the critical wave propagation density limit. Simply scaling up a single plasma source is not sufficient — plasma sources must be intelligently distributed across the processing area. This adds a critical constraint on the independent power control of each source, which traditional RF or microwave systems struggle to address, resulting in well-known uniformity issues, particularly at substrate edges.
SAIREM: Leading with Patented Innovation
Sairem has developed the PlasmaVac range of self-adaptive microwave plasma sources, powered by 2.45 GHz solid-state generators with a patented auto-adaptation algorithm. This innovative design eliminates impedance matching systems, prevents power loss within the source, and enables automatic adaptation across a wide range of operating conditions.
Pinpoint control and flexibility
Solid-state technology enables precise adjustment of power (1 W steps), frequency tuning (±50 MHz), and optional pulse modulation, allowing full control over the energy delivered to the process.
Advanced process stability
Built-in auto-tuning algorithms continuously minimize reflected power, ensuring stable operation even with varying loads or complex materials.
Safe and reliable operation
With no high voltage and no magnetron, EvoMicro generators offer extended lifetime, enhanced safety, and reduced maintenance requirements.
Easy integration
Compact, single-module design with full connectivity (fieldbus, PLC compatibility) allows seamless integration into laboratory setups or automated industrial systems.
Technical overview of PlasmaVac, the low pressure microwave plasma source
PlasmaVac ECR, a ECR Plasma Source (AuraWave)
The PlasmaVac ECR is an Electron Cyclotron Resonance (ECR) microwave plasma source operating at low pressure. It delivers high-density, uniform plasma with precise independent power control per source, making it ideal for PE-ALD, PE-ALE, and fine etching applications requiring minimal ion bombardment energy.
Its coaxial design eliminates internal power losses — no reflected power, no impedance matching system required, over 2 to 3 pressure decades depending on the gas.
PlasmaVac Coll, a Collisional Plasma Source
The PlasmaVac Coll is a self-adaptive collisional plasma source operating without magnets at higher pressures. It operates from 1 to 100 Pa, with no impedance matching system required over 1 pressure decade depending on the gas. It achieves plasma densities exceeding 10¹² cm⁻³ in argon and above 10¹¹ cm⁻³ in molecular gases such as O₂, N₂ and H₂ in multisource configuration at 10 cm from the source plane. Combined with Sairem’s solid-state generators, power transmitted to the plasma can be controlled Watt by Watt.
Like the PlasmaSpin 2.45 GHz, it is compatible with multiple input gases and scalable through parallel module installation, making it directly suited for Power-to-X, methane pyrolysis (carbon black and hydrogen production), and industrial gas abatement applications.
Our experts can help you to define or improve your process.
The PlasmaVac, low-pressure microwave plasma source offers a cutting-edge advantage :
Where RF sources reach their limits, the PlasmaVac low-pressure microwave plasma sources deliver the plasma density, radical concentration, and process uniformity required for PE-ALD, PE-ALE, PE-CVD, and advanced etching applications.
Complete your microwave installation!
Looking to integrate microwave plasma sources into your process?
A full range of accessories
To complete your microwave installation, SAIREM offers a full range of accessories and components, including waveguides, measurement accessories and impedance tuners.
Discover our microwave generators !
Sairem’s 2.45 GHz solid-state generators — the perfect match for your PlasmaVac plasma sources.
Multiple power options available.