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Plasma
Multi-source configurations for unlimited plasma surfaces
Multi-source microwave plasma systems enable large-area, high-density plasma with excellent uniformity through flexible configurations and independent power control of each source.
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PE-CVD: Thin Film Deposition by microwave plasma Activation
Understand the advantages PE-CVD, Thin Film Deposition by microwave plasma Activation
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Microwave Plasma-Assisted Atomic Layer Deposition (PE-ALD)
Understand why microwave Plasma-Assisted Atomic Layer Deposition (ALD) is an alternative to RF-plasma-assisted ALD
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