Plasma

Multi-source configurations for unlimited plasma surfaces

Multi-source microwave plasma systems enable large-area, high-density plasma with excellent uniformity through flexible configurations and independent power control of each source.

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PE-CVD: thin film deposition by microwave plasma activation

Understand the advantages PE-CVD, thin film deposition by microwave plasma activation with Sairem plasma sources.

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Microwave Plasma-Assisted Atomic Layer Deposition (PE-ALD)

Understand why microwave Plasma-Assisted Atomic Layer Deposition (ALD) is an alternative to RF-plasma-assisted ALD

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